(西安交通大学金属材料强度国家重点实验室， 西安 710049)
摘 要: 利用离子束增强沉积(IBED)技术制备了CrNx薄膜。 对不同能量氮离子轰击所制备的薄膜进行了X射线衍射、 X射线光电子能谱分析、 膜层断裂韧性以及摩擦学性能研究。 试验结果表明， 在相同试验条件下， 氮离子轰击能量影响CrNx薄膜的相组成及取向， 低能氮离子轰击所制薄膜具有较高的KIC数值， 且表现出更优异的摩擦学性能。
关键字: 离子束增强沉积(IBED) 薄膜 CrNx 摩擦磨损
（State Key Laboratory for Mechanical Behaviour of Materials,Xi'an Jiaotong University, Xi'an 710049, P. R. China
）
Abstract:CrNx films were synthesized with 4, 8 and 12 keV nitrogen ion of dose of 3.38×1013 cm-2·s-1 by IBED. The structure of the films was characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), wheras the wear and tear properties of the films were investigated on a block-on-ring tester. Results indicate that the phases and orientation of CrNx are affected obviously by nitrogen ion bombarding energy, and films with lower energy have better tribological property and higher fracture toughness, especially for 4keV.
Key words: IBED film CrNx wear and tear
