中国有色金属学报(英文版)
Transactions of Nonferrous Metals Society of China
| Vol. 33 No. 3 March 2023 |
（1. College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China;
2. Center of Chemistry for Frontier Technologies, Department of Chemistry, Zhejiang University, Hangzhou 310027, China;
3. College of Materials and Chemistry, China Jiliang University, Hangzhou 310018, China;
4. School of Materials Science and Energy Engineering, Foshan University, Foshan 528000, China）
Abstract:The effects of current density (Jk) and bath temperature on the structure of deposition layer of nickel and electrochemical noise energy (ED) are studied, and the relationship between the structure of the deposit and ED is also discussed in detail using electrochemical noise technique in coupled with the scanning electron microscopy and the glancing angle X-ray diffraction techniques. The results show that ED theoretically mainly reflects the severity or rate of the local cathodic reaction rather than the integral cathodic reaction, and is markedly influenced by the electroplating current density (Jk)-depended nucleation/growth kinetics of the nickel deposit film. The proceeding of the nucleation (or the formation of new phase)/growth process of crystal nucleus on a foreign substrate possesses much more effect on ED value than the subsequent homogenous growth of the already formed film particles, and the factors which can accelerate the drastic change of the electrode surface state should result in large ED value.
Key words: nickel; electroplating; electrochemical noise energy; deposit structure
