Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第28卷    第5期    总第230期    2018年5月

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文章编号:1004-0609(2018)-05-0955-09
溅射能量对WC/a-C:H薄膜结构与性能的影响
孙尚琪1, 2,刘 翔1,王永欣2,王立平2,薛群基2

(1. 昆明理工大学 材料科学与工程学院,昆明 650093; 2. 中国科学院 宁波材料技术与工程研究所,中国科学院海洋新材料与应用技术重点实验室,浙江省海洋材料与防护技术重点实验室,宁波 315201)

摘 要: 为探究溅射能量对WC/a-C:H薄膜结构与性能的影响,并讨论WC掺杂对a-C:H薄膜的影响。通过非平衡磁控溅射+等离子体增强化学气相沉积法(UBMS+PACVD),以WC靶作为溅射靶,C2H2为反应气体,通过调制溅射靶电流,在316不锈钢基体上制备WC/a-C:H系列薄膜。用场发射电镜、透射电镜、X射线衍射仪、XPS、拉曼光谱等对薄膜的微观结构和成分进行表征,用划痕仪、纳米硬度仪测试了薄膜的力学性能,用多功能摩擦机对薄膜的摩擦学性能进行分析。结果表明:WC主要以β-WC1-x纳米晶的形式均匀分布在非晶碳中,随着溅射靶电流的上升,薄膜中W含量和膜基结合力呈上升趋势,在11A时上升至21.9%(摩尔分数)和18.6 N,而ID/IG比值和硬度逐渐降低至0.55和11 GPa。溅射靶电流为4 A时,WC/a-C:H薄膜表现出较好的磨损性能,摩擦因数低至0.15,磨损率为5.38×10-7 mm3/(N?m)。

 

关键字: 溅射靶电流;WC/a-C:H薄膜;摩擦磨损

Effect of sputtering energy on structure and properties of WC/a-C:H films
SUN Shang-qi1, LIU Xiang1, WANG Yong-xin2, WANG Li-ping2, XUE Qun-ji2

1. School of Materials Science and Engineering, Kunming University of Science and Technology, Kunming 650093, China; 2. Key Laboratory of Marine Materials and Related Technologies of Chinese Academy of Sciences, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering of Chinese Academy of Sciences, Ningbo 315201, China

Abstract:In order to investigate the influence of sputtering energy on the structure and properties of WC/a-C:H films and discuss the influence of WC doping on a-C:H films, the series of WC/a-C:H films were prepared on 316 stainless steel substrates by modulating the target current with UBMS+PACVD method. The WC target and C2H2 were used as the sputtering target and the reaction gas, respectively. The microstructure and composition of the films were characterized by field emission electron microscopy, transmission electron microscopy, X-ray diffraction, XPS and Raman spectroscopy. Scratch tester and nano-hardness tester were used to test the mechanical properties of the films. The tribological properties of the film were analyzed by a trace test system. The results show that WC is mainly distributed in the amorphous carbon in the form of β-WC1-x nanocrystals. With the increase of the sputtering target current, the content of W and the binding force of the film increase to 21.9% (mole fraction) and18.6 N, respectively, while the content of ID/IG and hardness decrease at 0.55 and 11 GPa. When the target current is 4 A, the WC/a-C:H films exhibits good wear performance with a friction coefficient as low as 0.15 and a wear rate of 5.38×10-7 mm3/Nm.

 

Key words: sputtering target current; WC/a-C:H film; friction and wear

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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