中国有色金属学报(英文版)
Transactions of Nonferrous Metals Society of China
| Vol. 24 No. 9 September 2014 |
（1. College of Materials Science and Engineering, Chongqing University, Chongqing 400044, China;
2. Department of Materials Science and Engineering, Chongqing University of Science and Technology,
Chongqing 401331, China;
3. Institute of Materials Engineering, Ningbo University of Technology, Ningbo 315016, China）
Abstract:Nano-scaled ZrNbAlN films with different negative bias voltages (Vb) were deposited on bronze substrate and Si (100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a (111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at -70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at -90 V.
Key words: ZrNbAlN multilayer film; magnetron sputtering; composition; corrosion
