(西北有色金属研究院，西安 710016)
摘 要: 应用直流磁控溅射技术在单晶Al2O3基片上沉积纯钛薄膜，在350 ℃和500 ℃条件下应用不同的溅射功率分别沉积了厚度为50 nm和100 nm的纯钛薄膜。结果表明：在Al2O3(0001)基片上制备出具有面心立方结构的FCC相纯钛薄膜，当降低溅射功率或者降低基片温度时，薄膜由面心立方结构转变为六方的α相。继续增加膜层厚度至微米量级时，钛膜也会逐渐由面心立方结构转变为六方的α相。实验证明Ti多晶薄膜的相结构变化与薄膜的内应力、晶格取向和薄膜微结构有关。
关键字: 纯钛薄膜；面心立方；相变；磁控溅射；微结构
（Northwest Institute for Nonferrous Metal Research, Xi’an 710016）
Abstract:Titanium films were deposited by DC-sputtering on Al2O3 single-crystal substrates. Titanium films of 50 nm and 100 nm were prepared with different sputtering powers at 350 ℃ and 500 ℃. Face-centered cubic (FCC) structure Ti films are observed on Al2O3(0001) single-crystal substrates. The titanium films are shown to transform from FCC to HCP structure with temperature and sputtering power. The titanium films with thickness of micron dimension also show HCP structure. The results show that the phase structure changes of Ti polycrystalline thin films are related to the internal stress, crystal orientation of films and film microstructure.
Key words: Ti films; face-centered cubic; phase transform; sputtering; microstructure
