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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第24卷    第1期    总第178期    2014年1月

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文章编号:1004-0609(2014)01-0137-08
电流密度对柔性摩擦辅助电沉积镍镀层质量的影响
吕 镖1,2,胡振峰3,汪笑鹤2,徐滨士2

(1. 东北大学 材料与冶金学院,沈阳 110819;
2. 装甲兵工程学院 再制造技术国防科技重点实验室,北京 100072;
3. 装甲兵工程学院 机械产品再制造国家工程研究中心,北京 100072
)

摘 要: 为提高镀层沉积速度和沉积质量,采用新型的柔性摩擦辅助电沉积技术在不同的电流密度下制备了镍镀层。利用SEM、XRD、X射线应力衍射仪以及硬度计等手段对镍镀层的组织结构和性能进行了表征。结果表明:电流密度对柔性摩擦辅助电沉积镍镀层的质量具有重要影响。在1~13 A/dm2的电流密度范围内,随着电流密度的增大,柔性介质的摩擦整平作用逐渐减弱,镀层的择优取向发生了(111)晶面向(200)晶面的过渡转变;当电流密度达到13 A/dm2时,镍镀层出现了(200)和(220)晶面的双择优取向,但择优取向程度不大;电流密度为10 A/dm2时,柔性摩擦辅助电沉积镍镀层具有最低的拉应力,为150 MPa左右,最小的表面粗糙度为Ra=0.48 μm,最小的孔隙率为0.08 cm-2,最高的硬度为385 HV。

 

关键词: 电沉积;电流密度;柔性摩擦;显微组织;择优取向

Effect of current density on quality of electrodeposited Ni coatings by flexible friction
Lü Biao1, 2, HU Zhen-feng3, WANG Xiao-he2, XU Bin-shi2

1. School of Materials and Metallurgy, Northeastern University, Shenyang 110819, China;
2. National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing 100072, China;
3. National Engineering Research Center of Mechanical Products Remanufacturing,
Academy of Armored Forces Engineering, Beijing 100072, China

Abstract:In order to improve the speed and quality of deposition, Ni coatings were prepared by a novel flexible medium friction assisted electrodeposition technology at different current densities. The microstructures and properties of the Ni electroplating were characterized by SEM, XRD, X-ray stress diffraction and micro hardness tester, respectively. The results show that the current density has important effect on the quality of electrodeposited Ni coatings by flexible medium friction. At the current density of 1-13 A/dm2, with increasing current density, the leveling power gradually becomes weaken by flexible medium friction, and the preferred orientation of Ni coatings transits from (111) crystal face to (200) crystal face. When the current density reaches 13 A/dm2, the electrodeposited Ni shows dual preferred orientation of (200) and (220) crystal face, but the degree is not too high. At the current density of 10 A/dm2, flexible medium friction assisted Ni electroplating has the lowest residual stress about 150 MPa, lowest surface roughness Ra of 0.48 μm, lowest porosity of 0.08 cm-2 and highest microhardness of 385 HV.

 

Key words: electrodeposition; current density; flexible friction; microstructure; preferred orientation

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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