Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报(英文版)

Transactions of Nonferrous Metals Society of China

Vol. 23    No. 11    November 2013

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Growth and crystallization behaviors of anodic oxide films on putter-deposited titanium at very low potentials
Jun-heng XING, Zheng-bin XIA, Hui LI, Ying-ying WANG, Li ZHONG

School of Chemistry and Chemical Engineering, South China University of Technology, Guangzhou 510640, China

Abstract:Growth and crystallization of titanium anodized films were studied by performing the anodization of the sputter-deposited titanium samples under cyclic voltammetry (CV) mode at very low potentials. The surface features, crystalline behaviors and chemical compositions of the formed anodic oxide layers were detected by AFM, SE and XPS. It was found that the structure of the titanium anodized films is crystalline, even though the maximum oxidation potential (φmax) is very low (as low as 1000 mV). Both enlarging the applied voltage and reducing the potential scanning rate are beneficial for the growth and crystallization of titanium oxide films. It was thought that the internal compressive stress, other than the local joule heating accepted for many researchers, is the main force of stimulating the crystallization of anodic titanium oxide films at very low potentials.

 

Key words: anodization; sputter-deposited titanium; crystallization; low potential; cyclic voltammetry (CV)

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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