(1. 华南理工大学 材料科学与工程学院，广州 510641；
2. 广州有色金属研究院 新材料研究所，广州 510651)
摘 要: 采用阳极型气体离子源结合非平衡磁控溅射的方法，在单晶硅及Ti6Al4V钛合金基体上制备掺钨类金刚石多层膜(DLC/WC)，利用俄歇电子谱(AES)、透射电镜(TEM)、X射线光电子能谱(XPS)及X射线衍射(XRD)等对膜层的过渡层、界面及微观结构进行研究。结果表明：所制备的膜层厚2.7 μm，硬度高达3 550HV，摩擦因数为0.139，与Ti6Al4V基体结合力为52 N；W主要以纳米晶WC的形式与非晶DLC形成WC/DLC多层膜，该多层膜仍呈现出类金刚石膜的主要特征。
关键字: 类金刚石/碳化钨多层膜；微观结构；离子源；非平衡磁控溅射
（1. School of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China;
2. Department of New Materials, Guangzhou Research Institute of Non-ferrous Metals, ）
Abstract:Anodic gas ion beam source (IBS) and unbalance magnetron sputtering (UBM) were employed to deposit diamond-like carbon/WC (DLC/WC) multilayer film on Si. Auger electron spectroscopy (AES), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and microhardness tester were employed to evaluate the interface, microstructure and composition of films. The results show that the film thickness is 2.7 μm, hardness up to 3 550HV, the friction coefficient is 0.139, and adhesion strength is 52 N in Ti6Al4V substrate. In the film, nanocrystalline WC and amorphous DLC layer overlap the formation of DLC/WC multilayers. The multilayer film still shows that the main features, which are very similar to the DLC film.
Key words: diamond-like carbon/WC multilayer films; microstructure; ion source; unbalanced magnetron sputtering
