中国有色金属学报(英文版)
Transactions of Nonferrous Metals Society of China
| Vol. 22 Special 3 December 2012 |
（1. Nano Machining Laboratory, Korea Institute of Machinery and Materials, Daejeon 305-343, Korea;
2. Department of Nano-Mechatronics, University of Science and Technology, Daejeon 305-350, Korea;）
Abstract:The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti: sapphire laser (λp=790 nm). The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.
Key words: diffraction grating; refractive index modification; plasma formation; hybrid germanium-silica plate; femtosecond laser
