(河南大学 特种功能材料重点实验室，开封 475004)
摘 要: 采用离子束溅射与磁过滤阴极弧共沉积技术在单晶硅片(400)表面制备Si含量(摩尔分数)为3.2%~15.5%范围内的TiSiN薄膜。采用X射线光电子能谱(XPS)、电子散射谱(EDS)、X射线衍射仪(XRD)研究TiSiN薄膜的显微结构和力学性能。结果表明：低Si含量的薄膜以面心立方晶型的Ti(Si)N固溶体形式存在，择优晶面为(200)面；当Si含量饱和后，出现Ti(Si)N和Si3N4非晶相，形成Ti(Si)N/Si3N4纳米复合结构。薄膜硬度范围在22~26 GPa，采用Si3N4小球为对偶时薄膜的摩擦因数均维持在0.13~0.17之间。Si含量为10.9%时，硬度达最大值，结合较低的粗糙度，使其摩擦因数和磨损率达到最低值。
关键字: Ti-Si-N；纳米复合薄膜；纳米硬度；摩擦
（Laboratory of Special Functional Materials, Henan University, Kaifeng 475004, China）
Abstract:Ti-Si-N films containing 3.2%−15.5% Si (molar fraction) were deposited on Si(400) substrates by ion beam sputtering combined with filted cathodic arc system. X-ray photoelectron spectroscopy (XPS), energy dispersive spectroscopy (EDS) and X-ray diffractometry (XRD) were used to study the microstructure and mechanical properties of TiSiN films. The results suggest that a Ti(Si)N solid solution with face-centered cubic structure and (200) preferred crystalline orientation exist in the films with lower Si content. After saturation of Si, the films form a two-phase structure, consisting of Ti(Si)N and amorphous Si3N4. The hardness of films is in the range from 22 GPa to 26 GPa. The friction coefficients maintain at 0.13−0.17 using Si3N4 spheres as couples. The hardness of film with 10.9% Si reaches the maximum value, combined with lower roughness, which results that the friction coefficient and wear rate reaches the minimum value.
Key words: Ti-Si-N; nancomposite film; nanohardness; tribology
