Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第21卷    第11期    总第152期    2011年11月

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文章编号:1004-0609(2011)11-2857-06
Si(100)衬底上(110)取向La2/3Sr1/3MnO3薄膜的
制备与性能
李廷先1, 张 铭1, 王光明1, 郭宏瑞1, 李扩社2, 李喜露1, 周文龙1, 严 辉1

(1. 北京工业大学 材料学院,北京 100124;
2. 北京有色金属研究总院 稀土材料国家工程中心,北京100088
)

摘 要: 用脉冲激光沉积法在Si(100)衬底上制备了(110)择优取向的La2/3Sr1/3MnO3薄膜,研究了环境氧压对薄膜结晶度、取向、表面形貌和微结构的影响。结果表明:10 Pa氧压下沉积的薄膜具有高结晶度的(110)择优取向,晶粒分布均匀,晶粒分布均匀,表面均方根粗糙度Rrms为1.35 nm。与无明显择优取向的薄膜相比,(110)择优取向的La2/3Sr1/3MnO3薄膜具有较高的饱和磁化强度(Ms)、金属−绝缘体相变温度(TM-I)和较低的电阻率(ρ)。

 

关键字: 庞磁电阻;磁性材料;脉冲激光沉积;择优取向

Preparation and properties of (110) preferred orientation
La2/3Sr1/3MnO3 film deposited on Si (100) substrate
LI Ting-xian1, ZHANG Ming1, WANG Guang-ming1, GUO Hong-rui1,
LI Kuo-she2, LI Xi-lu1, ZHOU Wen-long1, YAN Hui1<

1. College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China;
2. National Engineering Research Central for Rare Earth Materials,
General Research Institute for Nonferrous Metals, Beijing 100088, China

Abstract:La2/3Sr1/3MnO3 films with highly (110) preferred orientation were deposited on Si (100) substrate without any buffer layer by using a pulsed laser deposition technique. The effects of oxygen pressure on crystallinity, preferred orientation, surface morphology, magnetic and electrical transport properties of the films were investigated. The results show that, comparing to the films deposited at other ambient oxygen pressure, La2/3Sr1/3MnO3 films deposited at 10 Pa presented highly (110) preferred orientation with highly crystalline quality and have more homogeneous grain size distribution as well as dense microstructure. Meanwhile, the roughness of the films also shows the smallest root mean square value (Rrms) of 1.35 nm. The film with the (110) preferred orientation shows higher saturated magnetization (Ms), higher metal-insulator transition temperature (TM-I) and lower resistivity (ρ) than that without preferred orientation one.

 

Key words: colossal magnetoresistance; magnetic materials; pulsed laser deposition; preferred orientation

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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