Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第21卷    第6期    总第147期    2011年6月

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文章编号:1004-0609(2011)06-1415-07
沉积参数对Mo-Re合金基体上沉积金刚石薄膜的影响
王  健,余志明,吴晓斌,刘  倩

(中南大学 材料科学与工程学院,长沙 410083)

摘 要: 采用热丝化学气相沉积法(HFCVD),以甲烷和氢气为反应气体,在综合性能良好的Mo-40%Re(摩尔分数)合金基体上沉积金刚石薄膜。采用X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)和显微激光拉曼光谱仪(Raman)分别对金刚石薄膜相组成、表面形貌、晶粒大小和质量等进行检测分析,研究CVD沉积参数,如基体温度(θs)、碳源浓度(R,CH4的体积分数)和沉积压强(p),对金刚石形核、生长和金刚石成膜的影响。结果表明:在合适的基体预处理条件下,当θs=750 ℃,R=3%,p=3.5 kPa时,薄膜平均线生长速率高达1 μm/h,得到的金刚石膜完整致密,晶粒大小均匀,纯度较高,具有明显的(111)织构。

 

关键词: 金刚石薄膜;Mo-Re合金;Raman光谱;阴极材料

Effects of deposition parameters on diamond film on
Mo-Re alloy substrate
WANG Jian, YU Zhi-ming, WU Xiao-bin, LIU Qian

School of Materials Science and Engineering, Central South University, Changsha 410083, China

Abstract:The diamond films were prepared on Mo-40%Re (mole fraction) alloy substrates by hot filament chemical vapor deposition (HFCVD) in a reactor with a background pressure of 10−5 Pa. The interlayer, diamond morphologies and the purity of the film were investigated by X-ray diffractometer (XRD), field emission scanning electron microscope (SEM) and Raman spectroscope (Raman), respectively. Meanwhile, the effects of process parameters, such as substrate temperature, gas composition and reactor pressure, on diamond growth were systematically studied. The results show an optimal growth condition being substrate temperature θs=750 ℃, volume fraction of CH4 R=3%, reaction pressure p=3.5 kPa. Under this condition, a high quality diamond film is obtained with a liner growth rate of 1 μm/h and an obvious (111) texture.

 

Key words: diamond film; Mo-Re alloy; Raman spectroscope; cathode material

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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