(1. 东南大学 材料科学与工程学院，南京 211189；
2. 东南大学 江苏省先进金属材料高技术研究重点实验室，南京 211189)
摘 要: 在Si基底上采用直流磁控溅射法制备CrN薄膜，利用原子力显微镜(AFM)、扫描电镜(SEM)和X射线衍射仪(XRD)分析薄膜表面形貌和物相成分，探讨薄膜生长的动力学过程。结果表明：只有当生长时间足够(1 800 s)时，才能形成具有CrN相的薄膜。随着CrN薄膜的生长，薄膜表面晶粒由三棱锥发展为三棱锥与胞状共存状，薄膜表面粗糙度逐渐增大，动力学生长指数β=0.50。
关键字: 直流磁控溅射；表面形貌；粗糙度；生长指数
magnetron sputtered CrN films on silicon substrate
（1. School of Material Science and Engineering, Southeast University, Nanjing 211189, China;
2. Jiangsu Key Laboratory of Advanced Metallic Materials, Southeast University, Nanjing 211189, China）
Abstract:The CrN films were deposited on silicon substrate by direct current (DC) magnetron sputtering. The atomic force microscope (AFM), scanning electron microscope (SEM) and X-ray diffractometer (XRD) were used to analyze film surface morphology and phase structure. The dynamics of film growth processes was investigated. The results show that CrN films are formed only when the deposition time is enough (1 800 s). With the growth of films the surface grains change from pyramidal structure to the coexistence of pyramidal and cellular structure, and the film surface roughness increases gradually. The growth exponent is β=0.50.
Key words: direct current magnetron sputtering; surface morphology; roughness; growth exponent
