Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第12卷    第1期    总第46期    2002年2月

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文章编号:1004-0609(2002)01-0057-04
氮化碳薄膜的电子结构和光学性质
杨兵初,罗成林

(中南大学 应用物理与热能工程系,长沙 410083)

摘 要: 在不同条件下用射频溅射方法制备了氮化碳薄膜。薄膜的电子结构和元素成分用傅里叶变换红外光谱(FTIR)和光电子能谱(XPS)进行分析,薄膜的光学性质用紫外-可见-近红外光谱(UV)进行检测。薄膜中的最大氮原子含量达到0.47,C1s和N1s电子的结合能产生了+2.41~-1.7eV的移动,移动的大小取决于制备条件。UV谱表明氮化碳薄膜能强烈地吸收紫外光,而对红外光有较好的透明性,在2720nm附近存在一明锐的吸收峰,并给出了形成这一明锐吸收峰的适宜条件。这些结果对作为保护光学涂层的红外应用是有意义的。

 

关键字: 氮化碳薄膜;光学性质;射频溅射;电子结构

Optical properties of carbon
nitride thin films prepared by
radio frequency sputtering
YANG Bing-chu, LUO Cheng-lin

Department of Applied Physics and Heat Energy Engineering,
Central South University,Changsha 410083, China

Abstract:Carbon nitride thin films are deposited under different conditions of radio frequency sputtering. An analysis of their electron structure and elemental composition is done with the help of Fourier transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy(XPS). By using ultraviolet-visible-near infrared (UV) spectroscopy,their optical properties are shown clearly. The maximum Natom content in the films reaches 0.47 and the binding energy (BE) of C1s and N1s photoelectron varies with deposition conditions, shifting between 2.41 and -1.7eV. UV spectra show that the films have pronounced optical absorption in ultraviolet region and good transparency in near infrared region, with a sharp absorption peak around 2720nm. The optimum condition, which causes the sharp absorption peak, is specified and these results is considered useful for infrared application as aprotective optical coating.

 

Key words: carbon nitride thin film; optical property; sputtering; electron structure

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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