(1. 上海电力学院 电化学研究室, 国家电力公司热力设备腐蚀与防护重点实验室, 上海 200090;
2. 华东理工大学 防腐蚀中心， 上海 200237;
3. 厦门大学 固体表面物理化学国家重点实验室, 厦门 361005)
摘 要: 用表面增强拉曼光谱技术(SERS)对在3%NaCl溶液中苯并三氮唑(BTA)及其衍生物4-羧基苯并三氮唑(4CBTA)对铜的缓蚀作用机理进行了研究。发现4CBTA对铜的缓蚀作用机理与BTA相似，在较正电位下两者都是通过三唑环与铜形成配合物覆盖在铜表面；随着电位负移，铜电极表面吸附的分子形式的BTA或4CBTA数量增多； 4CBTA中的COOH基团只是起到空间位阻的作用，没有参与电极表面的吸附。两者复配使用时以BTA吸附为主，其缓蚀机理没有发生改变，也没有产生协同效应。
关键字: 铜电极； 苯并三氮唑； 缓蚀剂； 表面增强拉曼光谱
copper electrode in 3% NaCl solution
（1. Electrochemical Research Group, Shanghai Institute of Electric Power,
Shanghai 200090, P.R.China;
2. Corrosion Prevention Center, East China University of Science and Technology,
Shanghai 200237, P.R.China;
3. State Key Laboratory for Physical Chemistry of Solid Surface,
Xiamen University, Xiamen 361005, P.R.China）
Abstract:The corrosion inhibition of BTA and its derivative 4CBTA on Cu electrode in 3% NaCl solution was studied by SERS technique. The inhibition mechanism for these inhibitors was found to be nearly the same, which form a protective film through the triazole ring. As the potential turns negative, the molecules of BTA or 4CBTA gradually adsorbs on the copper surface. The substitute group(_COOH) of 4CBTA acts as a steric hindrance. A combination of BTA and 4CBTA doesn't show any synergistic effect and the adsorption substance on the copper surface is mainly BTA.
Key words: Cu electrode； BTA； inhibitor； SERS
