(1. 太原理工大学 表面工程研究所， 太原 030024；
2.西安交通大学 材料科学与工程学院，西安 710074)
摘 要: 介绍了一种新型的在钢铁基体上制备钽薄膜的方法。该方法用网状钽片作阴极，它既是放电气体的离解源，又是沉积钽膜的钽离子供给源，其设备简单、价格低廉。实验中发现，在各个参数配比合适的条件下，可制备出结构为bcc(体心立方)和tetragonal(四方晶系)的钽薄膜。薄膜较致密且均匀，与基体的结合好。同时分析了在最佳工艺参数条件下合成钽膜的组织结构、表面和断口形貌、结合力等。
关键字: 网状阴极溅射； 空心阴极效应；钽薄膜
net-shape cathode sputtering method
（1. Research Institute of Surface Engineering，
Taiyuan University of Techenology，Taiyuan 030024， P.R.China；
2. School of Materials Science and Technology，
Xi′an Jiaotong University，Xi′an 710074, P.R.China）
Abstract:A new method， which synthesizes tantalum film by a net-shape sputtering cathode， has been introduced. By analyzing the structure， the surface and rapture morphology， nd the adhesion strength of synthesized Ta thin film using X-ray diffraction (XRD)， scanning electron microscope(SEM)， it was found that bcc α Ta and tetragonal β Ta film of tantalum are formed in 20 steel. Meanwhile， there is the formation of alloy layer between Ta film and steel substrate， which improves the adhesion strength of Ta film. The study manifests that the net-shape cathode sputtering device possesses many advantages and can be used for synthesizing the optimum quality film of tantalum.
Key words: net-shape cathode sputter； effect of hollow cathode； tantalum thin film
