(太原理工大学 化学工程系，太原 030024)
摘 要: 采用脉冲电沉积法在石墨基体上制备了铁氰化镍膜(NiHCF膜)。通过循环伏安法考察了不同脉冲参数(脉冲电压、脉冲周期、占空比、沉积次数)条件下制备的石墨基NiHCF膜电极的离子交换容量，并通过SEM和XPS分析了膜的表面形貌与组成。结果表明：脉冲电压0.3 V(vs SCE)、脉冲周期0.6 s、占空比为50%时沉积得到的NiHCF膜均匀致密，且具有较大的离子交换容量和良好的稳定性。脉冲电沉积法可用于制备性能优良的电化学控制离子分离膜电极。
关键字: 脉冲电沉积；NiHCF膜；电化学控制离子分离；循环伏安
（Department of Chemical Engineering, Taiyuan University of Technology, Taiyuan 030024, China）
Abstract:The electroactive nickel hexacyanoferrate (NiHCF) thin films were generated on graphite substrates by pulsed electrodeposition. The composition and morphology of the NiHCF thin film were investigated using XPS and SEM. In 1 mol/L KNO3 solution, the potential cycling in the range of 200−1 000 mV (vs SCE) is used to reversibly intercalate and deintercalate K+ from the matrix. The effects of the pulsed deposition parameters, such as pulse potential, duty cycle and deposition time (ton/toff) on the ion-exchange capacity of NiHCF film electrodes were investigated. The cycle life of the film electrodes was also investigated. The results show that the NiHCF thin films formed on graphite substrates are suitable for electrochemically controlled ion separation (ECIS) processes. The films display high ion exchange capacity for K+ and good stability, and the optimum pulse potential, pulse period and duty cycle are 0.3 V (vs SCE), 0.6s and 50%, respectively.
Key words: pulsed electrodeposition; NiHCF thin film; electrochemically controlled ion separation; cyclic voltammetry
