( 1. 长春大学 应用物理研究所， 长春 130022；
2. 吉林大学 材料科学与工程学院，
吉林大学汽车材料教育部重点实验室， 长春 130012)
摘 要: 采用直流磁控溅射方法， 以Ar和N2作为放电气体， 在单晶Si(100)衬底上沉积了Fe-N薄膜。 采用X射线衍射仪(XRD)、 X射线光电子能谱分析仪(XPS)、 原子力显微镜(AFM)和超导量子干涉仪(SQUIDS)对所制备的样品进行了结构、 成分、 形貌和磁性能分析， 研究了衬底温度对薄膜的结构、 形貌和磁性能的影响。 结果表明： 衬底温度对Fe-N薄膜的结构有重要的影响， 通过控制衬底温度可以获得单相γ′-Fe4N化合物薄膜； γ′-Fe4N具有较高的饱和磁化强度， 是非常有应用前景的磁记录介质及磁头功能材料。
关键字: Fe-N薄膜； 衬底温度； 磁性能
Fe-N thin films
（ 1. Institute of Applied Physics, Changchun University, Changchun 130022, China;
2. School of Materials Science and Engineering, Key Laboratory of Automobile Materials of Ministry of Education, Jilin University, Changchun 130012, China）
Abstract: The single-phase γ′-Fe4N thin films were deposited on single crystal Si(100) substrates by DC magnetron sputtering using an Ar/N2 gas mixture. The structure and magnetic properties of the films were characterized by X-ray diffractrometry, X-ray photoelectron spectroscopy, atomic force microscopy and superconducting quantum interference device(SQUID). The effects of substrate temperature on the structures, composition, surface morphology and magnetic properties of the thin films were investigated. The results show that substrate temperature has important effects on the structure of Fe-N films. γ′-Fe4N phase has a higher saturation magnetization and lower roughness. The γ′-Fe4N thin films will become function materials which have super soft magnetic property.
Key words: Fe-N thin films; substrate temperature; magnetic properties
