(哈尔滨工业大学 复合材料与结构研究所， 哈尔滨 150080)
摘 要: 采用过滤阴极真空电弧技术， 通过施加不同衬底偏压制备了非晶金刚石薄膜。 利用纳米压痕仪和光谱椭偏仪测试薄膜的力学性能和光学性能， 利用KLA-Tencor台阶仪测试硅衬底在薄膜沉积前后的曲率半径， 并根据Stoney方程计算薄膜应力， 利用可见光拉曼光谱和电子能量损耗谱研究了薄膜的微结构。 实验表明： 当衬底负偏压为80 V时， 薄膜的硬度、 弹性模量、 光学带隙和折射率均达到最大值， 随着偏压的升高或降低， 各参量分别降低； 此时， 薄膜的sp3杂化含量最高， 斜坡系数却最小； 在宽红外波段范围内， 薄膜的消光系数趋近于零， 即红外透明； 另外， 薄膜具有接近金刚石的高硬度和高模量， 并且其微结构以及光学和力学性能可调， 因此是一种优异的红外光学窗口增透保护薄膜材料。
关键字: 非晶金刚石； 过滤阴极真空电弧； 红外保护膜
（ Center for Composite Materials, Harbin Institute of Technology,
Harbin 150080, China）
Abstract: Amorphous diamond (a-D) films deposited by filtered cathodic vacuum arc (FCVA) technology with different substrate bias were investigated. The mechanical properties were characterized with nanoindenter and the stress was calculated using Stoney equation. The optical properties were analyzed by spectroscopic ellipsometry and the microstructure was investigated by visible Raman spectroscopy and electron energy loss spectroscopy. The maximal hardness and elastic modulus consorting with the highest stress are presented as the negative substrate bias is 80V. With the bias increases or decreases, hardness, elastic modulus and stress descend gradually. However, the high impinging energy benefits the adhesion between the films and the substrate. Additionally, the optical gap and the refractive index exhibits the same changing regularities, whereas the minimal extinction coefficient is obtained at negative bias of 80 V. It is found that the negative bias of 80 V is the sp3-rich deposition condition according to the EELS measurements and the Raman slope coefficient. The changing rules of the mechanical and optical properties can be explained in light of the growth mechanism and microstructure of the films. In short, a-D films deposited by the FCVA technology are good at the infrared protective coatings because the films are transparent in the wide infrared band and the microstructure and properties can be modulated.
Key words: amorphous diamond; filtered cathodic vacuum arc; protective coatings
