(哈尔滨工业大学材料科学与工程学院, 哈尔滨 150001)
摘 要: 采用等离子体基离子注氧技术（O2-PBII）对Ti6Al4V合金进行了表面改性处理， 实验过程中改变注入离子能量的工艺参数，负脉冲偏压分别为10、 20、 30 kV， 离子注入过程中样品台通油冷却以实现低温注入； 用XPS对离子注氧层的深度、 成分及化学结构进行了系统的分析。结果表明： 随着注入离子能量的增加， Ti6Al4V合金表面改性层的深度明显增加，改性层的外层由一定厚度的TiO2组成，外层与内层基体之间存在Ti2O3和TiO; Al元素在改性层的外层以氧化物形式存在，且该氧化物趋于表面生长； 在表面改性层的外层未发现V及其氧化物。
关键字: 等离子体基离子注入； XPS分析； 化学态
implanted with oxygen by plasma base ion implantation
（ School of Materials Science and Engineering,
Harbin Institute of Technology, Harbin 150001, China）
Abstract: The modified layers by O2-PBII technology on Ti6Al4V alloy surface were studied using X-ray photoelectron spectroscopy (XPS). The negative pulse voltage of 10, 20, 30 kV was applied to the sample, which was mounted on an oil-cooled sample holder. The results show that the thickness of the oxide layer increases with increasing implanted ion energy. The oxide layer is predominantly TiO2, which contains a small amount of suboxides TiO and Ti2O3 between the outmost layer and metallic substrate. The XPS analysis confirms that Al2O3 is located mainly in the outer surface of the modified layers， in which vanadium and vanadium oxide are not detected.
Key words: plasma-base-ion-implantation; X-ray photoelectron spectroscopy analysis; chemical state
