(中南大学 物理与科学技术学院, 长沙 410083)
摘 要: 以直流磁控溅射制备了类金刚石薄膜, 采用原子力显微镜（AFM）观察薄膜的表面形貌, 采用俄歇电子能谱（AES）分析薄膜的化学键和电子结构。 将参数D定义为俄歇电子能谱（AES）中最大正峰和最低负峰之间的距离, 用俄歇电子能谱中的D值求得不同沉积气压条件下制备的薄膜的sp2键的百分含量和sp2键与sp3键比率。 采用紫外-可见光透射光谱(UV-Vis)分析了薄膜的光吸收特性和光学带隙。 结果表明：沉积气压低于0.8 Pa时, sp2键的百分含量随沉积气压的增大而减小；薄膜的光学性质受光学带隙的直接影响。
关键字: 类金刚石薄膜； 光学性质； 电子结构； 俄歇电子能谱
（School of Physics Science and Technology,
Central South University, Changsha 410083, China）
Abstract: Diamond-like carbon (DLC) films were prepared by DC magnetron sputtering. The morphology and chemical bonding structure of the DLC films were investigated by atomic force microscopy (AFM) and auger electron spectroscopy( AES), respectively. A parameter ‘D’ defined as the distance between the maximum of positive going excursion and the minimum of negative going excursion was calculated in the derivative AES spectra. The values of ‘D’ were used to calculate the percentage of sp2 hybrid bonds and the ratio of sp2 to sp3. The optical transmission and absorption properties, and the optical band gap of the films were characterized by an UV-Vis spectrophotometer. The effects of the sputtering power density and the gas pressure on the optical character and optical band gap of the films were studied. The results indicate that beyond pAr=0.8 Pa, these values decrease with increasing deposition pressure, and the optical characteristic of the film is affected directly by optical band gap.
Key words: diamond-like carbon； optical property； electron structure； AES
