(1. 昆明理工大学 材料与冶金工程学院, 昆明 650093;
2. 东京电机大学 知能机械工学科, 鳩山, 埼玉, 日本 350-0394;
3. 昆明理工大学 机电工程学院, 昆明 650093)
摘 要: 采用1×1016 ions/cm2的注入剂量对TiNi形状记忆合金进行氮离子注入, 注入加速电压为 50 keV。 采用X射线衍射和X射线光电子能谱对氮离子注入前后 TiNi形状记忆合金表面的物相以及化学成分进行了分析。 结果表明, 氮离子注入前后TiNi 合金表面都被氧化。 氮离子注入前TiNi形状记忆合金表面存在少量TiO2、 Ti3O5和Ti2O3。 氮离子注入后的TiNi形状记忆合金表面有TiN新相生成, 且在氮离子注入后的TiNi形状记忆合金表面还存在少量TiO2、 Ti3O5 。
关键字: TiNi形状记忆合金; 表面分析; 氮离子注入
( 1. Faculty of Materials and Metallurgical Engineering,
Kunming University of Science and Engineering, Kunming 650093, China;
2. Department of Intelligent Mechanical Engineering, Tokyo Denki University, Hatoyama, Hiki-Gun Saitama, Japan 350-0394;
3. Faculty of Mechanical and Electrical Engineering,
Kunming University of Science and Engineering, Kunming 650093, China)
Abstract: TiNi shape memory alloy samples were nitrogen-ion implanted with the implantation dose of 1×1016 ions/cm2 and the acceleration voltages of 50 keV. X-ray diffraction analysis and X-ray photoelectron spectroscopy analysis were used to characterise the phase, the chemical composition and chemical state of the surface layer of the TiNi alloy samples and nitrogen-ion-implanted TiNi alloy samples. The results show that the surfaces of the TiNi alloy and nitrogen-ion-implanted TiNi alloy are all oxidized. TiO2, Ti2O3 and Ti3O5 exist on the TiNi sample surface. New phase TiN is produced on the surface of the nitrogen-ion-implanted TiNi sample, and there also exist small amounts of TiO2 and Ti3O5 on the nitrogen-ion-implanted TiNi sample surface.
Key words: TiNi shape memory alloy; surface analysis; nitrogen ion-implantation