Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第19卷    第1期    总第118期    2009年1月

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文章编号:1004-0609(2009)01-0167-07
金属镍电沉积中枝晶的分形生长
田宗军1, 2,王桂峰2,黄因慧1, 2,刘志东1, 2,陈劲松2

(1. 南京航空航天大学 江苏省精密与微细制造技术重点实验室,南京 210016;
2. 南京航空航天大学 机电学院,南京 210016
)

摘 要: 分别采用点电极电沉积和平行板电极喷射电沉积制备二维的镍枝晶,研究外加电压、电解质浓度、温度等对金属镍枝晶二维电沉积生长行为特性的影响,并从分形维数的角度对其进行分析。结果表明,在点电极电沉积时,枝晶的分形维数随外加电压的变化而波动,随NiSO4浓度和试验温度的升高而增大;气泡的析出使上述试验条件对枝晶生长特性的影响变得不明显。在喷射电沉积时,增大NiSO4浓度使气泡析出量减少,枝晶簇的分形维数随之减小,说明在大电流密度下,气泡对枝晶簇生长形貌的影响起主导作用;试验温度从55 ℃升高到60 ℃时分形维数先增加后减小。

 

关键字: 镍;分形;喷射电沉积

Fractal growth of Ni dendrite in electrodeposition
TIAN Zong-jun1, 2, WANG Gui-feng2, HUANG Yin-hui1, 2, LIU Zhi-dong1, 2, CHEN Jin-song2

1. Jiangsu Key Laboratory of Precision and Micro-Manufacturing Technology,
Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China;
2. College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics,
 Nanjing 210016, China

Abstract:Two-dimensional dendrites of Ni were fabricated by electrodeposition with point electrode and jet-electrodeposition with a parallel plate electrode, respectively. The influences of voltage, concentration of electrolyte and experimental temperature on the growth property and fractal dimension of dendrite were investigated. The results show that the fractal dimension of dendrite increases with the increase of concentration of NiSO4 and experimental temperature, and fluctuates with the variety of applied voltage in electrodeposition with a point electrode. The occurrence of bubble reduces the effects of those test conditions mentioned above; when the concentration of NiSO4 in jet-electrodeposition increases, the fractal dimension of dendrite cluster decreases gradually, which shows that the bubble takes a leading role in dendrite growth at a high current. An increase of experimental temperature from 55 ℃ to 60 ℃ makes the fractal dimension first increase and then decrease.

 

Key words: Ni; fractal; jet-electrodeposition

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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