(1. 重庆大学 机械工程学院，重庆 400044；2. 重庆大学 数理学院，重庆 400044；3. 重庆大学 材料科学与工程学院，重庆400044；4. Teer Coatings Ltd, West Stone House, Berry Hill Industrial Estate,Droitwich, Worcestershire, WR9, 9AS, United Kingdom)
摘 要: 研究在不同工艺条件下用直流反应磁控溅射技术在T10衬底上制备Cr-N涂层，并采用光电子能谱仪和XRD依次分析Cr-N涂层的表面结构和工艺参数对Cr-N涂层成分及相组成的影响。结果表明，Cr-N涂层在存放一段时间后表面产生复杂的Cr2O3相以及Cr(O，N)x相；常温下随着N2含量的增加，涂层相结构逐渐由Cr转变为化学比的CrN相。当N2含量为33.3％时，Cr-N涂层的相成分主要为Cr2N+CrN。并发现衬底偏压直接影响Cr-N系涂层的晶态及取向特征，当偏压增加到−130 V时，Cr-N涂层中β-Cr2N相结构逐渐转变为(110)和(300)取向结构。
关键字: 铬氮涂层；磁控溅射；T10；Cr2N；CrN
（1. College of Mechanical Engineering, Chongqing University, Chongqing 400044, China;2. College of Mathematics and Physics, Chongqing University, Chongqing 400044, China;3. College of Materials Science and Engineering, Chongqing University, Chongqing 400044, China;4. Teer Coatings Ltd, West Stone House, Berry Hill Industrial Estate, Droitwich, Worcestershire,WR9, 9AS, United Kingdom）
Abstract:A series of chromium-nitride coatings deposited on T10 substrates were prepared by direct current reactive magnetron sputtering with variable processing conditions, the phase and composition variation with different depositing processes were analyzed by X-ray diffraction, and surface structure of Cr-N coatings was analyzed by X-ray photoelectron spectroscopy. The results indicate that complicated Cr2O3 and Cr(O, N)x occur on surface of Cr-N coatings after these samples are deposited, under normal temperature conditions the phase changes from Cr to stoichiometry CrN with reactive gas N2 increasing. Phase composition of chromium-nitride coatings is mainly β-Cr2N+CrN when N2 content is 33.3％. Substrate bias voltage has significant effect on the phase state and the lattice orientation of the coating. As the bias voltage increases to −130 V, the diffraction summit of β-Cr2N phase gradually transfers into preferential orientations of (110) and (300).
Key words: chromium-nitride coatings; magnetron sputtering; T10; Cr2N; CrN
