(1. 中南大学 材料科学与工程学院，长沙 410083；2. 中南大学 粉末冶金国家重点实验室，长沙 410083；3. 株洲硬质合金集团，株洲 412000)
摘 要:
关键字: 金刚石薄膜；硬质合金；预处理；附着力
（1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;2. Key State Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China;3. Zhuzhou Cemented Carbide Group Corporation, Zhuzhou 412000, China）
Abstract:Diamond films were deposited on cemented tungsten carbide substrates of various cobalt content (3%, 6%, 10% and 12% Co) by hot filament chemical vapour deposition (HFCVD) to assess the role of cobalt on the quality and adhesion (reliability) of diamond coatings. The samples were characterized by X-ray diffractometry (XRD), scanning electron microscope (SEM) in combination with energy dispersive spectrometer (EDS). Prior to deposition, the substrates were submitted to surface roughening by Murakami’s etching and to surface binder removal by acid liquor. The adhesion was evaluated by Rockwell indentation tests (60 kg) conducted with a Brale indenter and compared with the adhesion of diamond films grown onto WC-3% Co, WC-6% Co, WC-10% Co, and WC-13% Co, which were submitted to similar etching pretreatments and identical deposition conditions. According to the statistic table of adhesion distribution of 105 samples, YG3 substrate which has enough adhesion is 89%, and that of YG6, YG10 and YG13 substrate is 24%, 7% and 0%, respectively. However, the rate-of-failure of them is 0%, 64%, 72% and 79%, respectively. The results show that diamond films on YG3 substrates exhibit good adhesion levels, compared with those obtained for HFCVD diamond on YG6, YG10 and YG13 with similar microstructure.
Key words: diamond films; cemented carbide; pretreatment; adhesion
