(1. 中南大学 材料科学与工程学院，长沙 410083；
2. 中南大学 粉末冶金国家重点实验室，长沙 410083)
摘 要:
关键字: 金刚石薄膜；硬质合金；硼化预处理；附着性能
on boronized WC-13%Cosubstrates
（1. College of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Key State Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China）
Abstract:The diamond films were deposited on boronized WC-13%Co substrates via hot filament chemical vapor deposition in a reactor with a background pressure of 10−6 Pa. The surface morphology, texture and adhesion of the diamond films were investigated by means of field emission scanning electron microscope, X-ray diffractrometry and Rockwell hardness tester, respectively. The results show that a surface layer of stable cobalt borides of CoB, CoW2 B2 and CoW3B3 formed at 950 ℃ can effectively reduce the diffusion of Co to the surface of cemented carbide substrates when diamond films are deposited. The surface morphology and texture of the diamond films are remarkably affected by the ambient pressure when the substrate temperature is 750−800 ℃ and the percent of CH4 is 3.3%. Compared with the two-step pretreatment, the boronizing is much better pretreatment to improve the adhesion.
Key words: diamond films; cemented carbide; boronizing pretreatment; adhesion
