(1. 中南大学 材料科学与工程学院，长沙410083；
2. 广州有色金属研究院 材料表面工程研究所，广州 510651)
摘 要: 采用中频磁控溅射结合无灯丝离子源技术沉积梯度Cr/CrN/CrNC/CrC膜层，设计两组正交实验对膜层中界面Cr层及梯度层沉积的工艺参数对附着性能的影响进行研究。利用扫描电镜(SEM)、电子能谱(EDS)对其表面形貌及梯度成分进行表征；用划痕仪、显微硬度计及洛氏硬度计测评其附着性能，并对比两者测评的有效性。所得最优工艺参数为：梯度层沉积偏压100 V，中频功率6.5 kW，真空度0.6 Pa；Cr层的沉积时间、离子源电流及中频功率分别为2 min、4 A和6.5 kW。高中频功率及离子辅助沉积Cr层能有效提高膜层附着力。
关键字: CrC；中频磁控溅射；离子源；附着力
（1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Guangzhou Research Institute of Nonferrous Metals,Guangzhou 510651, China）
Abstract:The Cr/CrN/CrNC/CrC graded interlayer was deposited by MF-magnetron sputtering combined with ion source technique. Two orthogonal experiments were designed to study the relationship between adhesion and processing parameters both for Cr-interface and interlayer. Surface morphology and composition of graded interlayer were characterized by SEM and EDS. The results show that, the optimum deposition parameters for interlayer are −100 V bias voltages, 6.5 kW MF power under pressure of 0.5 Pa; the optimum deposition parameters for Cr layer are deposition time of 2 min, ion resource current of 6 A and MF power of 6.5 kW. The deposition of Cr layer with high MF power and assistance of ion beam can improve the adhesion.
Key words: CrC; mid-frequency magnetron sputtering; ion source; adhesion
