Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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中国有色金属学报

ZHONGGUO YOUSEJINSHU XUEBAO

第17卷    第8期    总第101期    2007年8月

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文章编号:1004-0609(2007)08-1307-06
中频磁控溅射沉积梯度过渡Cr/CrN/CrNC/CrC膜的附着性能
牛仕超1, 2,余志明1,代明江2,林松盛2,侯惠君2,李洪武2

(1. 中南大学 材料科学与工程学院,长沙410083;
2. 广州有色金属研究院 材料表面工程研究所,广州 510651
)

摘 要: 采用中频磁控溅射结合无灯丝离子源技术沉积梯度Cr/CrN/CrNC/CrC膜层,设计两组正交实验对膜层中界面Cr层及梯度层沉积的工艺参数对附着性能的影响进行研究。利用扫描电镜(SEM)、电子能谱(EDS)对其表面形貌及梯度成分进行表征;用划痕仪、显微硬度计及洛氏硬度计测评其附着性能,并对比两者测评的有效性。所得最优工艺参数为:梯度层沉积偏压100 V,中频功率6.5 kW,真空度0.6 PaCr层的沉积时间、离子源电流及中频功率分别为2 min4 A6.5 kW。高中频功率及离子辅助沉积Cr层能有效提高膜层附着力。

 

关键词: CrC;中频磁控溅射;离子源;附着力

Adhesion of Cr/CrN/CrNC/CrC graded interlayer deposited by MF-magnetron sputtering
NIU Shi-chao1, 2, YU Zhi-ming1, DAI Ming-jiang2, LIN Song-sheng2,HOU Hui-jun2, LI Hong-wu2

1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Guangzhou Research Institute of Nonferrous Metals,Guangzhou 510651, China

Abstract:The Cr/CrN/CrNC/CrC graded interlayer was deposited by MF-magnetron sputtering combined with ion source technique. Two orthogonal experiments were designed to study the relationship between adhesion and processing parameters both for Cr-interface and interlayer. Surface morphology and composition of graded interlayer were characterized by SEM and EDS. The results show that, the optimum deposition parameters for interlayer are −100 V bias voltages, 6.5 kW MF power under pressure of 0.5 Pa; the optimum deposition parameters for Cr layer are deposition time of 2 min, ion resource current of 6 A and MF power of 6.5 kW. The deposition of Cr layer with high MF power and assistance of ion beam can improve the adhesion.

 

Key words: CrC; mid-frequency magnetron sputtering; ion source; adhesion

ISSN 1004-0609
CN 43-1238/TG
CODEN: ZYJXFK

ISSN 1003-6326
CN 43-1239/TG
CODEN: TNMCEW

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