Abstract:TiO₂ and N-doped TiO₂ films were deposited on the glass substrates by arc ion plating method. The results show that the deposition rate does not change with the increasing deposition time. The increase of mass flow rate of N₂ gives rise to the increase of deposition rate. All as-deposited TiO₂ and N-doped TiO₂ films are amorphous. The anatase TiO₂ phase with preferred orientation (101) is acquired by post-annealing at 400 ℃ for 2 h. The incorporation of N into the TiO₂ films and the heat treatment extensively shift the band edge to the visible light region.

Key words: arc ion plating; photocatalytic TiO₂; N-doped TiO₂; absorption edge