Transactions of Nonferrous Metals Society of China The Chinese Journal of Nonferrous Metals

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Transactions of Nonferrous Metals Society of China

Vol. 19    No. 2    April 2009

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Effect of sputtering pressure and rapid thermal annealing on
optical properties of Ta2O5 thin films
ZHOU Ji-cheng(周继承), LUO Di-tian(罗迪恬), LI You-zhen(李幼真), LIU Zheng(刘 正)

School of Physics Science and Technology, Central South University, Changsha 410083, China

Abstract: Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta2O5 thin films are amorphous. It takes hexagonal structure (δ-Ta2O5) after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure (L-Ta2O5) occurs at 900−1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.


Key words: Ta2O5 thin films; DC reactive magnetron sputtering; sputtering pressure; rapid thermal annealing(RTA)

ISSN 1004-0609
CN 43-1238/TG

ISSN 1003-6326
CN 43-1239/TG

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